Pure tungsten carbide
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High pure tugnsten carbide sputtering target with binder-free is manufacturerd by us. The material is widedly used in industrial sectors such as semiconductor, chemical vapor deposition and physical vapor deposition display and optical appications.  The sputtering target is provided with various shapes like rod, bar, plate or customization. The philosophy of sputtering that work is to make thin film deposition of target material upon a solid substrate by conversion into gaseous or plasma phase via ionic bombardment.

  • Pure tungsten carbid...

  • Pure tungsten carbid...

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